Effect of sputtering rate and ion irradiation on the microstructure and magnetic properties of Ni Si3 N4 multilayers

Journal of Applied Physics

Volumn 98, Issue 11, 2005, Pages

  Vila, M ^a   Prieto, C ^a   Traverse, A ^b   Ramirez R ^c  

^a CSIC   (Spain)

^b UNIVERSITÉ PARIS SACLAY   (France)

^c UNIVERSIDAD CARLOS III DE MADRID   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

MAGNETIC CHARACTERIZATION; SILICON NITRIDE MATRIX; X-RAY-ABSORPTION FINE-STRUCTURE (EXAFS);

HELIUM; NICKEL; NITROGEN; PHOSPHORUS; SILICON; SPECTROSCOPIC ANALYSIS; SPUTTERING; THICKNESS CONTROL;

MULTILAYERS;

EID: 29144462593     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2137882     Document Type: Article

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