Electrical characterization of oxygen-induced nanosized ripples on aluminum thin films by conductive atomic force microscopy

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 243, Issue 1, 2006, Pages 16-19

  Mishra, P ^a   Karmakar, P ^a   Ghose, D ^a  

^a SAHA INSTITUTE OF NUCLEAR PHYSICS   (India)

Author keywords

Al thin film; C AFM; Electrical characterization; O2+ ion; Ripple

Indexed keywords

ALUMINUM; ATOMIC FORCE MICROSCOPY; INSULATING MATERIALS; ION BEAMS; SPUTTERING; THIN FILMS;

AL THIN FILMS; C-AFM; ELECTRICAL CHARACTERIZATION; RIPPLE;

NANOSTRUCTURED MATERIALS;

EID: 29144436269     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2005.07.245     Document Type: Article

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