Copper nanopattern on Si O2 from sputter etching a CuSi O2 interface

Applied Physics Letters

Volumn 86, Issue 7, 2005, Pages 1-3

  Stepanova, M ^a   Dew, S K ^a   Soshnikov, I P ^b  

^a UNIVERSITY OF ALBERTA   (Canada)

^b IOFFE INSTITUTE   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; COPPER; ETCHING; INTERFACES (MATERIALS); ION BEAMS; MONTE CARLO METHODS; NANOTECHNOLOGY; SELF ASSEMBLY; SILICA; SPUTTER DEPOSITION;

COPPER NANOPATTERNS; GLASS WAFERS; ION BEAM ETCHING; SPUTTER ETCHING;

NANOSTRUCTURED MATERIALS;

EID: 17044405122     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1864247     Document Type: Article

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