Fabrication of a nanogap on a metal nanowire using scanning probe lithography

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 40, Issue 6 B, 2001, Pages 4365-4367

  Miyazaki, T ^a   Kobayashi, K ^a   Horiuchi, T ^a   Yamada, H ^a   Matsushige, K ^a  

^a KYOTO UNIVERSITY   (Japan)

Author keywords

Molecular electronics; Nanogap electrodes; Nanowire; Scanning probe lithography

Indexed keywords

ATOMIC FORCE MICROSCOPY; CONDUCTIVE MATERIALS; CURRENT VOLTAGE CHARACTERISTICS; ELECTROCHEMICAL ELECTRODES; ELECTRON BEAMS; ETCHING; INTEGRATED CIRCUIT MANUFACTURE; METALLIC FILMS; PHOTOLITHOGRAPHY;

METAL NANOWIRES; NANOGAP ELECTRODES; SCANNING PROBE LITHOGRAPHY (SPL);

NANOTECHNOLOGY;

EID: 0035357722     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.40.4365     Document Type: Article

References (17)