Pseudospark electron beam as an excitation source for extreme ultraviolet generation

Applied Physics Letters

Volumn 87, Issue 13, 2005, Pages 1-3

  Jiang, Chunqi ^a   Kuthi, Andras ^a   Gundersen, Martin A ^a   Hartmann, Werner ^b  

^a University of Southern California ^*  (United States)

^b SIEMENS AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EXTREME ULTRAVIOLET (EUV); PULSE ENERGY REQUIREMENT; REPETITION-RATE OPERATION;

ELASTICITY; ELECTRONIC PROPERTIES; ULTRAVIOLET RADIATION; XENON;

ELECTRON BEAMS;

EID: 28344450621     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2053352     Document Type: Article

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