A multi-kilohertz pinch plasma radiation source for extreme ultraviolet lithography

Microelectronic Engineering

Volumn 57-58, Issue , 2001, Pages 71-77

  Bergmann, Klaus ^a   Rosier, Oliver ^b   Lebert, Rainer ^a   Neff, Willi ^a   Poprawe, Reinhart ^a  

^a FRAUNHOFER INSTITUTE FOR LASER TECHNOLOGY   (Germany)

^b RWTH AACHEN UNIVERSITY   (Germany)

Author keywords

Extreme ultraviolet; Extreme ultraviolet lithography; Gas discharge plasma; Pinch plasma; Xenon

Indexed keywords

ELECTRON EMISSION; LASER PRODUCED PLASMAS; PHOTOLITHOGRAPHY; PINCH EFFECT; SYNCHROTRON RADIATION; XENON;

EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY;

ULTRAVIOLET RADIATION;

EID: 0035450352     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(01)00437-3     Document Type: Article

References (5)

1. Intense xenon capillary discharge for extreme ultraviolet lithography in the 10-16 nm wavelength region
2. Radio-frequency-preionized xenon z-pinch source for extreme ultraviolet lithography
3. Highly repetitive, extreme ultraviolet radiation source based on a gas discharge plasma
4. Pinch-plasma radiation source for extreme ultraviolet lithography with a kilohertz repetition frequency