Self-annealing and aging effect characterization on copper seed thin films

Microelectronic Engineering

Volumn 82, Issue 3-4 SPEC. ISS., 2005, Pages 289-295

  Brunoldi, G ^a   Guerrieri, S ^a   Alberici, S G ^a   Ravizza, E ^a   Tallarida, G ^b   Wiemer, C ^b   Marangon, T ^a  

^a STMICROELECTRONICS   (Italy)

^b LABORATORIO MDM   (Italy)

Author keywords

Copper; Reflectivity; Seed; Seed aging; Self annealing

Indexed keywords

AGING OF MATERIALS; COPPER; CRYSTALLINE MATERIALS; MICROSTRUCTURE; THIN FILMS;

SEED-AGING; SELF-ANNEALING;

ANNEALING;

EID: 28044470513     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2005.07.037     Document Type: Conference Paper

References (23)

1. C. Detavernier, D. Deduytsche, R.L. Van Meirhaeghe, J. De Baerdemaeker, and C. Dauwe Appl. Phys. Lett. 82 12 2003 1863 1865
2. L.T. Koh, G.Z. You, C.Y. Li, and P.D. Foo Microelectron. J. 33 3 2002 229 234
3. V.A. Vas'ko, I. Tabakovic, S.C. Riemer, and M.T. Kief Microelectron. Eng. 75 1 2004 71 77
4. M.-S. Yoon, Y.-J. Park, and Y.-C. Joo Thin Solid Films 408 1-2 2002 230 235
5. W.H. Teh, L.T. Koh, S.M. Chen, J. Xie, C.Y. Li, and P.D. Foo Microelectron. J. 32 7 2001 579 585
6. Q.-T. Jiang, and M.E. Thomas J. Vac. Sci. Technol. B 19 3 2001 762 766
7. K. Ueno, T. Ritzdorf, and S. Grace J. Appl. Phys. 86 9 1999 4930 4935
8. C. Detavernier, S. Rossnagel, C. Noyan, S. Guha, C. Cabral Jr., and C. Lavoie J. Appl. Phys. 94 5 2003 2874 2881
9. H. Lee, S.D. Lopatin, A.F. Marshall, S.S. Wong, in: Proceedings of the IEEE 2001 International Interconnect Technology Conference (Cat. No.01EX461), 2001, pp. 236-238.
10. N. Marechal, E. Quesnel, and Y. Pauleau J. Vac. Sci. Technol. A 12 3 1994 707 713
11. J.J. Kim, and S.K. Kim Appl. Surf. Sci. 183 2001 311 318
12. D. Contestable-Gilkes, D. Ramappa, M. Oh, and S.M. Merchant J. Electron. Mater. 31 10 2002 1047 1051
13. J.P. Lu, L. Chen, D. Gonzales, H.L. Guo, D.J. Rose, M. Marudachalam, W.Y. Hsu, H.Y. Liu, F. Cataldi, B. Chatterjee, P.B. Smith, P. Holverson, R.L. Guldi, N.M. Russell, G. Shinn, S. Zuhoski, J.D. Luttmer, in: IEEE, 0-7803-6679-4/01, 2001.
14. S.Y. Lee, N. Mettlack, N. Nguyen, Y.M. Sun, and J.M. White Appl. Surf. Sci. 206 2003 102 109
15. C.-W. Liu, J.-C. Tsao, M.-S. Tsai, and Y.-L. Wang J. Vac. Sci. Technol. A 22 6 2004
16. J.F. Moulder et al., Handbook of X-ray Photoelectron Spectroscopy, Physical Electronics, 1995.
17. N.S. McIntyre, and M.G. Cook Anal. Chem. 47 1975 2208
18. N.S. McIntyre, S. Sunder, D.W. Shoesmith, and F.W. Stanchell J. Vac. Sci. Technol. 18 1981 714
19. T.L. Barr J. Phys. Chem. 82 1978 1801
20. B. Vincent Crist, Handbook of Monochromatic XPS Spectra, XPS International, vol. 1, 1999.
21. D. Rats, L. Vandenbulcke, R. Herbin, R. Benoit, R. Erre, V. Serin, and J. Sevely Thin Solid Films 270 1995 177
22. C.A. Olsson, and S.E. Hornstrom Corrosion Sci. 36 1994 141
23. M. Bou, J.M. Martin, T. Le Mogne, and L. Vovelle Appl. Surf. Sci. 47 1991 149