Flow and temperature dependence of particle formation in Ar-Silane rf capacitively coupled plasmas

High Temperature Material Processes

Volumn 9, Issue 3, 2005, Pages 345-352

  Sorokin, M ^a   Kroesen, G M W ^a   Stoffels, W W ^a  

^a EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

Complex Plasmas; Diagnostics; Dust; Flow; Harmonics; Plasma CVD; Plasma Impedance; Silane; Temperature

Indexed keywords

EID: 27844561494     PISSN: 10933611     EISSN: None     Source Type: Journal    
DOI: 10.1615/HighTempMatProc.v9.i3.20     Document Type: Article

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