Stress evolution during growth in direct-current-sputtered zinc oxide films at various oxygen flows

Journal of Applied Physics

Volumn 98, Issue 7, 2005, Pages

  Drese, Robert J ^a   Wuttig, Matthias ^a  

^a RWTH AACHEN UNIVERSITY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ENERGETIC PARTICLES; HIGH-MOBILITY FILMS; METALLIC TARGET; STRESS EVOLUTION;

DEPOSITION; EXPLOSIVES; MAGNETRON SPUTTERING; OXYGEN; PRESSURE EFFECTS; STOICHIOMETRY; STRESS ANALYSIS; THICKNESS MEASUREMENT; ZINC OXIDE;

FILM GROWTH;

EID: 27144536279     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2061888     Document Type: Article

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