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Volumn 98, Issue 7, 2005, Pages

Hysteresis in gadolinium oxide metal-oxide-semiconductor capacitors

Author keywords

[No Author keywords available]

Indexed keywords

CHARGED CAPACITANCE; GADOLINIUM OXIDE; HYSTERESIS GAPS;

EID: 27144463614     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2084333     Document Type: Article
Times cited : (7)

References (11)
  • 1
    • 84948765339 scopus 로고    scopus 로고
    • The 7th International Symposium on Plasma Process-Induced Damage Proceeding, Hawaii, pp.
    • P. J. Tzeng, Y. Y. Chang, K. Shu, and C. Liao, in The 7th International Symposium on Plasma Process-Induced Damage Proceeding, Hawaii, pp. 49-52 (2002).
    • (2002) , pp. 49-52
    • Tzeng, P.J.1    Chang, Y.Y.2    Shu, K.3    Liao, C.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.