Growth kinetics and thermodynamic stability of octadecyltrichlorosilane self-assembled monolayer on Si (100) substrate

Materials Letters

Volumn 59, Issue 29-30, 2005, Pages 3890-3895

  Kulkarni, Sneha A ^a,b   Mirji, S A ^a   Mandale, A B ^a   Gupta, R P ^b   Vijayamohanan, Kunjukrishna P ^a  

^a NATIONAL CHEMICAL LABORATORY   (India)

^b CENTRAL ELECTRONICS ENGINEERING RESEARCH INSTITUTE   (India)

Author keywords

Gibbs's free energy ( G); Growth kinetics; Octadecyltrichlorosilane (OTS); Self assembled monolayers (SAMs); Zisman plot

Indexed keywords

ADHESION; ADSORPTION; ATOMIC FORCE MICROSCOPY; CONTACT ANGLE; FOURIER TRANSFORM INFRARED SPECTROSCOPY; GIBBS FREE ENERGY; GROWTH KINETICS; HYDROPHILICITY; MONOLAYERS; RATE CONSTANTS; SELF ASSEMBLY; SILICON; SUBSTRATES; THERMODYNAMIC STABILITY; WATER;

LANGMUIR ADSORPTION ISOTHERMS; OCTADECYLTRICHLOROSILANE (OTS); SILICON SURFACES; ZISMAN PLOT;

SILANES;

EID: 26844447252     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matlet.2005.07.026     Document Type: Article

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