Synthesis and evaluation of pure-silica-zeolite BEA as low dielectric constant material for microprocessors

Industrial and Engineering Chemistry Research

Volumn 43, Issue 12, 2004, Pages 2946-2949

  Mitra, Anupam ^a,b   Cao, Tiegang ^a   Wang, Huanting ^a,c   Wang, Zhengbao ^a,d   Huang, Limin ^a,e   Li, Shuang ^a   Li, Zijian ^a   Yan, Yushan ^a  

^a University of California Riverside   (United States)

^b WASEDA UNIVERSITY   (Japan)

^c UNIVERSITY OF HONG KONG   (Hong Kong)

^d ASAHI KASEI CORPORATION   (Japan)

^e Och Spine at New York Presbyterian Hospitals   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DIELECTRIC MATERIALS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; METALLIC FILMS; MICROPROCESSOR CHIPS; POLYCRYSTALLINE MATERIALS; SCANNING ELECTRON MICROSCOPY; SILICA; STAINLESS STEEL; SYNTHESIS (CHEMICAL); THERMOGRAVIMETRIC ANALYSIS; X RAY DIFFRACTION ANALYSIS;

GEL COMPOSITION; PURE-SILICA-ZEOLITE (PSZ) FILMS;

ZEOLITES;

SILICON DIOXIDE; STAINLESS STEEL; ZEOLITE;

SYNTHESIS; ZEOLITE;

ARTICLE; ATOMIC EMISSION SPECTROMETRY; COMPUTER; CRYSTALLIZATION; DIELECTRIC CONSTANT; FILM; FOURIER TRANSFORMATION; GEL; INFRARED SPECTROSCOPY; MATERIALS; MICROPROCESSOR; SCANNING ELECTRON MICROSCOPY; SYNTHESIS; THERMOGRAVIMETRY; X RAY DIFFRACTION;

EID: 2642566936     PISSN: 08885885     EISSN: None     Source Type: Journal    
DOI: 10.1021/ie034062k     Document Type: Article

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