Electrochemical oscillation of open circuit potential during immersion plating of copper on silicon

Journal of the Electrochemical Society

Volumn 152, Issue 8, 2005, Pages

  Ogata, Yukio H ^a   Sasano, Junji ^a   Itoh, Takamasa ^a   Sakka, Tetsuo ^a   Rayón, Emilio ^b   Pastor, Ester ^b   Parkhutik, Vitali ^b  

^a KYOTO UNIVERSITY   (Japan)

^b UNIVERSITAT POLITÈCNICA DE VALÈNCIA   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

CIRCUIT OSCILLATIONS; CONCENTRATION (PROCESS); DOPING (ADDITIVES); MATHEMATICAL MODELS; NETWORKS (CIRCUITS); POLARIZATION; SILICON; SURFACE CHEMISTRY;

DOPANTS; ELECTROCHEMICAL OSCILLATIONS; IMMERSION PLATING; OPEN CIRCUITS;

COPPER PLATING;

EID: 25644439867     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1946369     Document Type: Article

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