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Applied Surface Science

Volumn 147, Issue 1, 1999, Pages 6-13

Effect of dopant type on immersion plating into porous silicon layer

(3) Tsuboi, Takashi a Sakka, Tetsuo a Ogata, Yukio H a

a KYOTO UNIVERSITY (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; BROMINE COMPOUNDS; CHLORINE COMPOUNDS; COPPER; DEPOSITION; DOPING (ADDITIVES); FOURIER TRANSFORM INFRARED SPECTROSCOPY; OXIDATION; PLATING; SILICA; SILVER;

DOPANT; IMMERSION PLATING;

POROUS SILICON;

EID: 0032660744 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/S0169-4332(99)00123-3 Document Type: Article

Times cited : (40)

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