The atomic layer CVD™ Growth of titanium nitride from in situ-reduced titanium chloride

Advanced Metallization Conference (AMC)

Volumn , Issue , 2000, Pages 295-300

  Elers, Kai Erik ^a   Saanila, Ville ^a   Soininen, Pekka J ^a   Haukka, Suvi ^a  

^a ASM Microchemistry Oy   (Finland)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; POLYCRYSTALLINE MATERIALS; SILICON WAFERS; SUBSTRATES; TITANIUM NITRIDE;

FILM DEPOSITION;

THIN FILMS;

EID: 0034461703     PISSN: 10480854     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (13)