Characterization, modeling and impact of scattered light in low-k 1 lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5754, Issue PART 1, 2005, Pages 285-293

  Fontaine, Bruno La ^a   Deng, Yunfei ^a,d   Dusa, Mircea ^b   Acheta, Alden ^a   Fumar Pici, Anita ^b   Bolla, Harish ^a   Cheung, Beverly ^c   Singh, Bhanwar ^c   Levinson, Harry J ^a  

^a ADVANCED MICRO DEVICES   (United States)

^b ASML   (Netherlands)

^c Nanometrics ^*

^d KLA TENCOR CORPORATION   (United States)

Author keywords

ACLV; Flare; Scattered light; Scatterometry; Simulation

Indexed keywords

ACLV; FLARES; SCATTEROMETRY;

COMPUTER SIMULATION; DATA REDUCTION; FABRICATION; LENSES; MATHEMATICAL MODELS; PHOTOLITHOGRAPHY; SCANNING;

LIGHT SCATTERING;

EID: 25144493086     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.601188     Document Type: Conference Paper

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