Influence of Anti-Reflection Coatings in ArF Lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5256, Issue 2, 2003, Pages 995-1005

  La Fontaine, Bruno ^a   Pawloski, Adam R ^a   Acheta, Alden ^a   Deng, Yunfei ^a,c   Levinson, Harry J ^a   Spence, Christopher ^a   Chovino, Christian ^b   Dieu, Laurent ^b   Johnstone, Eric ^b   Kalk, Franklyn ^b  

^a ADVANCED MICRO DEVICES   (United States)

^b DuPont Photomasks Inc   (United States)

^c UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANTIREFLECTION COATINGS; IMAGE ANALYSIS; IMAGING TECHNIQUES; PRINTING; SILICON WAFERS;

SCANNERS;

PHOTOLITHOGRAPHY;

EID: 11144356641     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.518220     Document Type: Conference Paper

References (1)

1. 1 KrF and ArF Lithography" Bruno La Fontaine, Mircea Dusa, Alden Acheta, Cinti Chen, Anatoly Bourov, Harry Levinson, Lloyd C. Litt, Melchior Mulder, Rolf Seltman, Judith Van Praagh; Proc. SPIE. Vol.4691, pp.44-56 (2002)