The Effects of Reticle Reflectance on Lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5256, Issue 1, 2003, Pages 256-265

  Cummings, Kevin D ^a   Geh, Bernd ^b   Lu, Bing ^c   Wasson, James ^c   Weisbrod, Eric ^c   Dauksher, Bill ^c   Nordquist, Kevin ^c   Mangat, Pawitter ^c  

^a ASML US Inc   (United States)

^b CARL ZEISS SMT AG   (Germany)

^c MOTOROLA INC   (United States)

Author keywords

Chrome absorber; Mask reflectivity; Reticle absorber; Reticle reflectivity

Indexed keywords

DENSITY (OPTICAL); ETCHING; IMAGE ANALYSIS; LIGHT ABSORPTION; LIGHT REFLECTION; MASKS; OPTICAL RESOLVING POWER; PHYSICAL VAPOR DEPOSITION; THIN FILMS;

CHROME ABSORBERS; MASK REFLECTIVITY; RETICLES;

LITHOGRAPHY;

EID: 1842422549     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.516925     Document Type: Conference Paper

References (4)

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