Design and process limited yield at the 65nm node and beyond

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5756, Issue , 2005, Pages 230-239

  Monahan, Kevin ^a   Trafas, Brian ^a  

^a KLA TENCOR CORPORATION   (United States)

Author keywords

Advanced process control; APC; Design for manufacturability; DFM; Electron microscopy; Grating based overlay; Immersion lithography; Simulation; Spectroscopic ellipsometry; Yield

Indexed keywords

ADVANCED PROCESS CONTROL (APC); DESIGN FOR MANUFACTURABILITY (DFM); GRATING-BASED OVERLAYS; IMMERSION LITHOGRAPHY; SPECTROSCOPIC ELLIPSOMETRY; YIELD;

COMPUTER SIMULATION; ELECTRON BEAMS; ELECTRON MICROSCOPY; ELLIPSOMETRY; LIGHT POLARIZATION; OPTIMIZATION; PROCESS CONTROL;

LITHOGRAPHY;

EID: 25144461031     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.605369     Document Type: Conference Paper

References (9)

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