Feasibility of improving CD-SEM-based APC system for exposure tool by spectroscopic-ellipsometry-based APC system

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5755, Issue , 2005, Pages 138-144

  Lin, W ^a   Liao, S ^a   Tsai, R ^a   Yeh, M ^a   Hsieh, C ^a   Yu, Y ^a   Lin, B S ^a   Fu, S ^b   Dziura, T G ^c  

^a UNITED MICROELECTRONICS CORPORATION   (Taiwan)

^b KLA Tencor Taiwan   (Taiwan)

^c KLA TENCOR CORPORATION   (United States)

Author keywords

APC; CD; CD SEM; Exposure Energy; SCD; SpectraCD

Indexed keywords

APC; CD; CD-SEM; EXPOSURE ENERGY; SCD; SPECTRA CD;

DATA ACQUISITION; ENERGY ABSORPTION; FEEDBACK; MEASUREMENT THEORY; POLYSILICON; PROCESS CONTROL;

SCANNING ELECTRON MICROSCOPY;

EID: 25144476176     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.598983     Document Type: Conference Paper

References (3)

1. K. Monahan, "Microeconomics of Accelerated Shrinks in Demand-Limited Markets," ISSM 2001.
2. R. M. Peters, R. H. Chiao, T. Eckert, R. Labra, D. Nappa, S. Tang, and J. Washington, "Production Control of Shallow Trench Isolation (STI) at the 130nm Node Using Spectroscopic Ellipsometry Based Profile Metrology", Proc. SPIE, vol. 5375, pp. 798-806 (2004).
3. V. Ukraintsev, "Effect of bias variation on total uncertainty of CD measurements", Proc. SPIE, vol. 5038, pp. 644-650 (2003).