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Volumn 5043, Issue , 2003, Pages 41-56

Microeconomics of yield learning in semiconductor manufacturing

Author keywords

[No Author keywords available]

Indexed keywords

COST EFFECTIVENESS; INSPECTION; LITHOGRAPHY; MATHEMATICAL MODELS; PROCESS CONTROL; PRODUCTIVITY;

EID: 0345303752     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.485288     Document Type: Conference Paper
Times cited : (2)

References (12)
  • 1
    • 0032628376 scopus 로고    scopus 로고
    • An application of model-based, lithographic process control for cost-effective IC manufacturing at 0.13 micron and beyond
    • K. M. Monahan, P. Lord, C. Hayzelden, and W. Ng, "An application of model-based, lithographic process control for cost-effective IC manufacturing at 0.13 micron and beyond", Proc. SPIE, Vol. 3677, p. 435 (1999).
    • (1999) Proc. SPIE , vol.3677 , pp. 435
    • Monahan, K.M.1    Lord, P.2    Hayzelden, C.3    Ng, W.4
  • 4
    • 0003309140 scopus 로고    scopus 로고
    • On-line diagnostics as a key part of process module control
    • M. Locy, "On-line diagnostics as a key part of process module control", Proc. ISSM 2000.
    • Proc. ISSM 2000
    • Locy, M.1
  • 5
    • 0003234226 scopus 로고    scopus 로고
    • Process module control for low-k interlevel dielectrics
    • C. Hayzelden, et al., "Process module control for low-k interlevel dielectrics", Proc. ISSM 2000.
    • Proc. ISSM 2000
    • Hayzelden, C.1
  • 6
    • 0002736997 scopus 로고    scopus 로고
    • Detection of critical process defects using in-line bright-field inspection technology
    • Tokyo, Japan
    • A. L. Swecker, A. J. Strojwas, A. Levy, B. Bell, and S. Ashkenaz, "Detection of critical process defects using in-line bright-field inspection technology", Proc. ISSM'98, p. 261 (1988), Tokyo, Japan.
    • (1998) Proc. ISSM'98 , pp. 261
    • Swecker, A.L.1    Strojwas, A.J.2    Levy, A.3    Bell, B.4    Ashkenaz, S.5
  • 7
    • 0025433611 scopus 로고
    • The use and evaluation of yield models in integrated circuit manufacturing
    • J. E. Cunningham, "The use and evaluation of yield models in integrated circuit manufacturing", IEEE Transactions on Semiconductor Manufacturing, Vol. 3, p. 60 (1990).
    • (1990) IEEE Transactions on Semiconductor Manufacturing , vol.3 , pp. 60
    • Cunningham, J.E.1
  • 8
    • 0032650210 scopus 로고    scopus 로고
    • A new approach to correlating overlay and yield
    • M. E. Preil and J. F. M. McCormack, "A new approach to correlating overlay and yield", Proc. SPIE, Vol. 3677, p. 208 (1999).
    • (1999) Proc. SPIE , vol.3677 , pp. 208
    • Preil, M.E.1    McCormack, J.F.M.2
  • 9
    • 0032674940 scopus 로고    scopus 로고
    • Measuring fab overlay programs
    • R. Martin, X. Chen, and I. Goldberger, "Measuring fab overlay programs", Proc. SPIE Vol. 3677, p. 64 (1999).
    • (1999) Proc. SPIE , vol.3677 , pp. 64
    • Martin, R.1    Chen, X.2    Goldberger, I.3
  • 10
    • 0023595736 scopus 로고
    • The taguchi approach to parameter design
    • D. M. Byrne and S. Taguchi, "The Taguchi approach to parameter design", Quality Progress, p. 19 (1987).
    • (1987) Quality Progress , pp. 19
    • Byrne, D.M.1    Taguchi, S.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.