-
1
-
-
0032628376
-
An application of model-based, lithographic process control for cost-effective IC manufacturing at 0.13 micron and beyond
-
K. M. Monahan, P. Lord, C. Hayzelden, and W. Ng, "An application of model-based, lithographic process control for cost-effective IC manufacturing at 0.13 micron and beyond", Proc. SPIE, Vol. 3677, p. 435 (1999).
-
(1999)
Proc. SPIE
, vol.3677
, pp. 435
-
-
Monahan, K.M.1
Lord, P.2
Hayzelden, C.3
Ng, W.4
-
2
-
-
0033701157
-
Accelerated yield learning in aggressive lithography
-
K. M. Monahan, S. Ashkenaz, X. Chen, P. Lord, M. Merrill, R. Quattrini, and J. Wiley, "Accelerated yield learning in aggressive lithography", Proc. SPIE, Vol. 3998, p. 492 (2000).
-
(2000)
Proc. SPIE
, vol.3998
, pp. 492
-
-
Monahan, K.M.1
Ashkenaz, S.2
Chen, X.3
Lord, P.4
Merrill, M.5
Quattrini, R.6
Wiley, J.7
-
3
-
-
0033333765
-
Optimized sample planning for wafer defect inspection
-
Santa Clara, California
-
R. Williams, D. Gudmundsson, K. M. Monahan, R. Nurani, M. Stoller, and J. G. Shanthikumar, "Optimized sample planning for wafer defect inspection", Proc. ISSM'99, p. 43 (1999), Santa Clara, California.
-
(1999)
Proc. ISSM'99
, pp. 43
-
-
Williams, R.1
Gudmundsson, D.2
Monahan, K.M.3
Nurani, R.4
Stoller, M.5
Shanthikumar, J.G.6
-
4
-
-
0003309140
-
On-line diagnostics as a key part of process module control
-
M. Locy, "On-line diagnostics as a key part of process module control", Proc. ISSM 2000.
-
Proc. ISSM 2000
-
-
Locy, M.1
-
5
-
-
0003234226
-
Process module control for low-k interlevel dielectrics
-
C. Hayzelden, et al., "Process module control for low-k interlevel dielectrics", Proc. ISSM 2000.
-
Proc. ISSM 2000
-
-
Hayzelden, C.1
-
6
-
-
0002736997
-
Detection of critical process defects using in-line bright-field inspection technology
-
Tokyo, Japan
-
A. L. Swecker, A. J. Strojwas, A. Levy, B. Bell, and S. Ashkenaz, "Detection of critical process defects using in-line bright-field inspection technology", Proc. ISSM'98, p. 261 (1988), Tokyo, Japan.
-
(1998)
Proc. ISSM'98
, pp. 261
-
-
Swecker, A.L.1
Strojwas, A.J.2
Levy, A.3
Bell, B.4
Ashkenaz, S.5
-
7
-
-
0025433611
-
The use and evaluation of yield models in integrated circuit manufacturing
-
J. E. Cunningham, "The use and evaluation of yield models in integrated circuit manufacturing", IEEE Transactions on Semiconductor Manufacturing, Vol. 3, p. 60 (1990).
-
(1990)
IEEE Transactions on Semiconductor Manufacturing
, vol.3
, pp. 60
-
-
Cunningham, J.E.1
-
8
-
-
0032650210
-
A new approach to correlating overlay and yield
-
M. E. Preil and J. F. M. McCormack, "A new approach to correlating overlay and yield", Proc. SPIE, Vol. 3677, p. 208 (1999).
-
(1999)
Proc. SPIE
, vol.3677
, pp. 208
-
-
Preil, M.E.1
McCormack, J.F.M.2
-
9
-
-
0032674940
-
Measuring fab overlay programs
-
R. Martin, X. Chen, and I. Goldberger, "Measuring fab overlay programs", Proc. SPIE Vol. 3677, p. 64 (1999).
-
(1999)
Proc. SPIE
, vol.3677
, pp. 64
-
-
Martin, R.1
Chen, X.2
Goldberger, I.3
-
10
-
-
0023595736
-
The taguchi approach to parameter design
-
D. M. Byrne and S. Taguchi, "The Taguchi approach to parameter design", Quality Progress, p. 19 (1987).
-
(1987)
Quality Progress
, pp. 19
-
-
Byrne, D.M.1
Taguchi, S.2
-
12
-
-
0033686556
-
Sampling plan optimization for detection of lithography and etch CD process excursions
-
R. C. Elliott, R. K. Nurani, S. J. Lee, L. Ortiz, M. Preil, J. G. Shantikumar, T. Riley, and G. Goodwin, "Sampling plan optimization for detection of lithography and etch CD process excursions", Proc. SPIE, Vol. 3998, p. 527 (2000).
-
(2000)
Proc. SPIE
, vol.3998
, pp. 527
-
-
Elliott, R.C.1
Nurani, R.K.2
Lee, S.J.3
Ortiz, L.4
Preil, M.5
Shantikumar, J.G.6
Riley, T.7
Goodwin, G.8
|