SCOPUS 정보 검색 플랫폼

Chinese Optics Letters

Volumn 3, Issue 8, 2005, Pages 490-493

Effect of oxygen flow rate on the properties of SiOx films deposited by reactive magnetron sputtering

(5) Lai, Fachun a,b Li, Ming a Wang, Haiqian a Jiang, Yousong c Song, Yizhou c

a UNIVERSITY OF SCIENCE AND TECHNOLOGY OF CHINA (China)

b FUJIAN NORMAL UNIVERSITY (China)

c Shincron Co Ltd (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; LIGHT EXTINCTION; MAGNETRON SPUTTERING; OPACITY; OXYGEN; REFRACTIVE INDEX; SILICA; SILICON COMPOUNDS; SPECTROPHOTOMETERS; SURFACE ROUGHNESS; X RAY PHOTOELECTRON SPECTROSCOPY;

OPTICAL TRANSMITTANCE; OXYGEN FLOW RATE (OFR); REACTIVE MAGNETRON SPUTTERING;

OPTICAL FILMS;

EID: 24744444775 PISSN: 16717694 EISSN: None Source Type: Journal
DOI: None Document Type: Article

Times cited : (10)

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