PREVAIL - Latest electron optics results

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4688, Issue 2, 2002, Pages 535-546

  Pfeiffer, Hans C ^a   Golladay, Steven D ^a   Gordon, Michael S ^a   Kendall, Rodney A ^a   Lieberman, Jon E ^a   Rockrohr, James D ^a   Stickel, Werner ^a   Yamaguchi, T ^b   Okamoto, Kazuya ^b   Umemoto, Takaaki ^b   Shimizu, Hiroyasu ^b   Kojima, Shinichi ^b   Hamashima, Muneki ^b  

^a IBM MICROELECTRONICS   (United States)

^b NIKON CORPORATION   (Japan)

Author keywords

Curvilinear variable axis; CVAL; Electron projection lithography; Electron projection optics; EPL; Large area reduction projection optics; Next generation lithography; NGL; PREVAIL

Indexed keywords

COMPUTER SOFTWARE; ELECTRON BEAM LITHOGRAPHY; LENSES; OPTICAL PROPERTIES;

ELECTRON PROJECTION LITHOGRAPHY (EPL);

ELECTRON OPTICS;

EID: 18544383794     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.472331     Document Type: Article

References (9)

1. H. C. Pfeiffer, R. S. Dhaliwal, S. D. Golladay, S. K. Doran, M. S. Gordon, R. A. Kendall, J. E. Lieberman, D. J. Pinckney, R. J. Quickle, C. F. Robinson, J. D. Rockrohr, W. Stickel, and E. V. Tressler, "PREVAIL - EPL Alpha Tool Electron Optics Subsystem", Proc. SPIE Vol. 4343 (2001) 70;
2. S. D. Golladay, H. C. Pfeiffer, C. A. Bohnenkamp, R. S. Dhaliwal, W. A. Enichen, M. S. Gordon, R. A. Kendall, J. E. Lieberman, J. D. Rockrohr, W. Stickel, and E. V. Tressler, A. Tanimoto, T. Yamaguchi, K. Okamoto, K. Suzuki, T. Miura, T. Okino, S. Kawata, K. Morita, S. C. Suzuki, H. Shimizu, S. Kojima, G. Varnell, W. T. Novak, and M. Sogard, "PREVAIL- EPL alpha tool: Early results", J. Vac. Sci. Technol. B19(6) (2001) 2459
3. H. C. Pfeiffer, R. S. Dhaliwal, S. D. Golladay, S. K. Doran, M. S. Gordon, R. A. Kendall, J. E. Lieberman, D. J. Pinckney, R. J. Quickle, C. F. Robinson, J. D. Rockrohr, W. Stickel, and E. V. Tressler, A. Tanimoto, T. Yamaguchi, K. Okamoto, K. Suzuki, T. Miura, T. Okino, S. Kawata, K. Morita, S. C. Suzuki, H. Shimizu, S. Kojima, G. Varnell, W. T. Novak, and M. Sogard, "PREVAIL e-beam stepper alpha tool", Microelectronic Eng. 57-58 (2001) 163
4. J. Canning, "Introduction and Objectives", in proceedings of 5th NGL Workshop, Pasadena, Ca, August 28-30, 2001
5. H. C. Pfeiffer, R. S. Dhaliwal, S. D. Golladay, S. K. Doran, M. S. Gordon, T. R. Groves, R. A. Kendall, J. E. Lieberman, P. F. Petric, D. J. Pinckney, R. J. Quickle, C. F. Robinson, J. D. Rockrohr, J. J. Senesi, W. Stickel, and E. V. Tressler, A. Tanimoto, T. Yamaguchi, K. Okamoto, K. Suzuki, T. Okino, S. Kawata, K. Morita, S. C. Suzuki, H. Shimizu, S. Kojima, G. Varnell, W. T. Novak, D. P. Stumbo, and M. Sogard, "Projection reduction exposure with variable axis immersion lenses: Next generation lithography", J. Vac. Sci. Technol. B17(6) (1999) 2840
6. S. Kojima, W. Stickel, J. D. Rockrohr, and M. S. Gordon, "Electron optical image correction subsystem in electron projection lithography", J. Vac. Sci. Technol. B18(6) (2000) 3017
7. S. D. Golladay, H. C. Pfeiffer, J. D. Rockrohr, and W. Stickel, "PREVAIL Alpha system: Status and design considerations", J. Vac. Sci. Technol. B18(6) (2000) 3072
8. W. Stickel, "Simulation of Coulomb interactions in electron beam lithography systems - A comparison of theoretical models", J. Vac. Sci. Technol. B16(6) (1998) 3211
9. M. S. Gordon, W. A. Enichen, S. D. Golladay, H. C. Pfeiffer, C. F. Robinson, and W. Stickel, "PREVAIL: Dynamic correction of aberrations", J. Vac. Sci. Technol. B18(6) (2000) 3079