Nanoimprint lithography: The path toward high tech, low cost devices

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5751, Issue I, 2005, Pages 46-55

  Tong, William M ^a,b   Hector, Scott D ^c   Jung, Gun Young ^b   Wu, Wei ^b   Ellenson, James ^a   Kramer, Kenneth ^a   Hostetler, Timothy ^a   Richards, Susan K ^a   Williams, R Stanley ^b  

^a HEWLETT PACKARD COMPANY   (United States)

^b HEWLETT PACKARD LABORATORIES   (United States)

^c FREESCALE SEMICONDUCTOR INC   (United States)

Author keywords

Cost of ownership; Disruptive technology; Nanoimprint lithography; NGL

Indexed keywords

COSTS; DATA STORAGE EQUIPMENT; FABRICATION; MASKS; NANOTECHNOLOGY; OPTICAL RESOLVING POWER;

COST OF OWNERSHIP; DISRUPTIVE TECHNOLOGY; NANOIMPRINT LITHOGRAPHY; NGL;

PHOTOLITHOGRAPHY;

EID: 24644510731     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.607236     Document Type: Conference Paper

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