A reticle quality management strategy in wafer fabs addressing progressive mask defect growth problem at low k1 lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5567, Issue PART 1, 2004, Pages 89-97

  Bhattacharyya, Kaustuve ^a   Son, Kong ^a   Eynon, Ben ^a   Gudmundsson, Dadi ^a   Jaehnert, Carmen ^b   Uhlig, Doris ^b  

^a KLA TENCOR CORPORATION   (United States)

^b INFINEON TECHNOLOGIES AG   (Germany)

Author keywords

Crystal growth; Defects; Frequency; Inspection; Photomask; Re qualification

Indexed keywords

COST EFFECTIVENESS; CRYSTAL GROWTH; DATA REDUCTION; DEFECTS; NATURAL FREQUENCIES; OPTIMIZATION; PARAMETER ESTIMATION; QUALITY CONTROL; RANDOM ACCESS STORAGE; RANDOM PROCESSES;

MASK RE-QUALIFICATION FREQUENCIES; PHOTOMASKS; RE-QUALIFICATION; RETICLE-QUALITY DEGRADATION;

LITHOGRAPHY;

EID: 19844363048     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.568874     Document Type: Conference Paper

References (5)

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2. K. Kimmel, Mask Industry Assessment: 2002, Introductory paper, BACUS Symposium on Photomask Technology, 2002.
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