Narrow polydispersity polymers for microlithography: synthesis and properties

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2724, Issue , 1996, Pages 249-260

  Barclay, George G ^a   Hawker, C J ^a   Ito, Hiroshi ^a   Orellana, Arturo J ^a   Malenfant, P R ^a   Sinta, Roger F ^a  

^a SHIPLEY COMPANY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DISSOLUTION; LITHOGRAPHY; MOLECULAR WEIGHT; PERFORMANCE; POLYMERIZATION; POLYMERS;

DEEP-ULTRAVIOLET RESISTS; POLYDISPERSITY;

PHOTORESISTS;

EID: 0029749712     PISSN: None     EISSN: None     Source Type: None    
DOI: 10.1117/12.241823     Document Type: Conference Paper

References (20)