EUV imaging - An aerial image study

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5374, Issue PART 1, 2004, Pages 53-63

  Lowisch, Martin ^a   Dinger, Udo ^a   Mickan, Uwe ^b   Heil, Tilmann ^a  

^a CARL ZEISS SMT AG   (Germany)

^b ASML   (Netherlands)

Author keywords

Aerial image; EUVL; Mask error factor; Process window

Indexed keywords

ABERRATIONS; ELECTROMAGNETIC WAVE DIFFRACTION; ERROR ANALYSIS; IMAGING TECHNIQUES; MASKS; SENSITIVITY ANALYSIS; SURFACE ROUGHNESS; ULTRAVIOLET RADIATION; WAVEFRONTS;

AERIAL IMAGES; EUVL SYSTEMS; MASK ERROR FACTORS; PROCESS WINDOW ANALYSIS;

LITHOGRAPHY;

EID: 3843146077     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.537338     Document Type: Conference Paper

References (8)

1. Max Born, Emil Wolf, "Priciples of optics", Cambridge University Press 1999, ISBN 0 521 642 221
2. Sang Hun Lee, Patrick Naulleau, Christof Krautschik, Manish Chandhok, Henry Chapman, Donna J. O'Connell, Michael Goldstein "Lithographic flare measurements of EUV full-field projection optics", Proc. SPIE Vol. 5037, p. 103-111, Emerging Lithographic Technologies VII: Roxann L. Engelstad; Ed. (2003)
3. Eric M. Gullikson, Sherry L. Baker, John E. Bjorkholm, Jeffrey Bokor, Kenneth A. Goldberg, John E. Goldsmith, Claude Montcalm, Patrick P. Naulleau, Eberhard A. Spiller, Daniel G. Stearns, John S. Taylor, James H. Underwood, "EUV scattering and flare of 10X projection cameras", Proc. SPIE Vol. 3676, p. 717-723, Emerging Lithographic Technologies III (1999)
4. The International Technology Roadmap for Semiconductors 2003
5. Udo Dinger, Günther Seitz, Stefan Schulte, Frank Eisert, Christian Münster, Stefan Burkart, Siegfried Stacklies, Christian Bustaus, Hubert Höfer, Maximilian Mayer, Bernhard Fellner, Oliver Hocky, Markus Rupp, Klaus Riedelsheimer, Peter Kürz "Fabrication and metrology of diffraction limited soft x-ray optics for the EUV microlithography", Proc. SPIE (2003) in the press
6. Christof G. Krautschik, Manish Chandhok, Guojing Zhang, Sang Hun Lee, Michael Goldstein, Eric M. Panning, Bryan J. Rice, Robert L. Bristol, Vivek Singh, "Implementing flare compensation for EUV masks through localized mask CD resizing" Proc. SPIE Vol. 5037, p. 58-68, Emerging Lithographic Techn. VII; Roxann L. Engelstad; Ed. (2003)
7. Alfred Kwok-Kit Wong, "Resolution enhancement techniques in optical lithograpy, Tutorial texts in optical engineering, Vol. TT47, SPIE press, ISBN 0-8194-3995-9 (2001)
8. Franklin M. Schellenberg, Chris A. Mack Proc. SPIE Vol. 3873, p. 189-202, 19th Annual Symposium on Photomask Technology; (1999)