Surface charge heterogeneities measured by atomic force microscopy

Environmental Science and Technology

Volumn 39, Issue 17, 2005, Pages 6352-6360

  Taboada Serrano, Patricia ^a   Vithayaveroj, Viriya ^a   Yiacoumi, Sotira ^a   Tsouris, Costas ^a,b  

^a Georgia Institute of Technology   (United States)

^b OAK RIDGE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AGGLOMERATION; ATOMIC FORCE MICROSCOPY; COPPER; DEPOSITION; IONS; SILICA; SURFACE ROUGHNESS; X RAY PHOTOELECTRON SPECTROSCOPY;

CHARGE REVERSAL; SECONDARY MINIMUM AGGREGATION; SURFACE CHARGE HETEROGENITIES; SURFACE POTENTIAL;

COLLOIDS;

COPPER ION; ELECTROLYTE; SILICON DIOXIDE; SILICON NITRIDE; WATER;

ATOMIC FORCE MICROSCOPY; COLLOID;

ADSORPTION; ARTICLE; ATOMIC FORCE MICROSCOPY; CHEMICAL ANALYSIS; FORCE; IONIC STRENGTH; MEASUREMENT; MICROSCOPE; PH;

COLLOIDS; COPPER; HYDROGEN-ION CONCENTRATION; MICROSCOPY, ATOMIC FORCE; OSMOLAR CONCENTRATION; PARTICLE SIZE; SILICON COMPOUNDS; SILICON DIOXIDE; SPECTROMETRY, X-RAY EMISSION; SURFACE PROPERTIES; WATER POLLUTANTS;

EID: 24644498083     PISSN: 0013936X     EISSN: None     Source Type: Journal    
DOI: 10.1021/es050100a     Document Type: Article

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