Evaluation of functional properties of imaging materials for water immersion lithography

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5753, Issue I, 2005, Pages 508-518

  Hinsberg, W D ^a   Hoffnagle, J A ^a   Wallraff, G M ^a   Larson, C E ^a   Houle, F A ^a   Sundberg, L ^a   Truong, H D ^a   Davis, B W ^a   Allen, R D ^a  

^a NONE

Author keywords

Chemically amplified resists; Immersion; Leaching; Line edge roughness; Resolution

Indexed keywords

AERIAL PHOTOGRAPHY; COATING TECHNIQUES; CONTAMINATION; IMAGING TECHNIQUES; INTERFEROMETRY; LEACHING; MECHANICAL PERMEABILITY; PHOTORESISTS; SUBSTRATES; TRACE ANALYSIS;

CHEMICALLY AMPLIFIED RESISTS; IMMERSION; LINE EDGE ROUGHNESS (LER); RESOLUTION;

WATER;

EID: 24644484933     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.600560     Document Type: Conference Paper

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