At-wavelength inspection of defect smoothing in EUVL masks

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4688, Issue 1, 2002, Pages 395-400

  Yi, Moonsuk ^a   Park, Mincheol ^a   Mirkarimi, Paul ^b   Larson, Cindy ^b   Bokor, Jeffrey ^a,c  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^b LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

^c UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

Actinic; At wavelength; Defect smoothing; EUVL; Inspection; Mask; Phase defect

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CRYSTAL DEFECTS; MASKS; MOLYBDENUM; OPTICAL COATINGS; OPTICAL MULTILAYERS; SEMICONDUCTING SILICON; SUBSTRATES; ULTRAVIOLET RADIATION;

EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL);

PHOTOLITHOGRAPHY;

EID: 0036380186     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.472314     Document Type: Article

References (8)

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