Deposition of hydrogen-free silicon nitride thin films by microwave ECR plasma enhanced magnetron sputtering at room temperature

Chinese Physics Letters

Volumn 22, Issue 9, 2005, Pages 2332-2334

  Ding, Wan Yu ^a   Xu, Jun ^a   Piao, Yong ^a   Li, Yan Qin ^a   Gao, Peng ^a   Deng, Xin Lu ^a   Dong, Chuang ^a  

^a DALIAN UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL BONDS; CYCLOTRONS; ELECTRON CYCLOTRON RESONANCE; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MAGNETRON SPUTTERING; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

BONDING TYPE; BOTH FOURIER TRANSFORM INFRARED; ECR PLASMA; MAGNETRON SPUTTERING SYSTEMS; MICROWAVE ELECTRON CYCLOTRON RESONANCE PLASMAS; N 2 FLOW; PLASMA ENHANCED MAGNETRON SPUTTERING; SILICON NITRIDE (SIN); SILICON NITRIDE THIN FILMS; X-RAY PHOTOELECTRONS;

SILICON NITRIDE;

EID: 24644461198     PISSN: 0256307X     EISSN: None     Source Type: Journal    
DOI: 10.1088/0256-307X/22/9/053     Document Type: Article

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