Optimization of a low-stress silicon nitride process for surface-micromachining applications

Sensors and Actuators, A: Physical

Volumn 58, Issue 2, 1997, Pages 149-157

  French, Patrick J ^a,c   Sarro, Pasqualina M ^a   Mallée, Rolf ^a   Fakkeldij Elke J M , E J M ^b   Wolffenbuttel, Reinoud F ^a  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

^b Laboratory of Materials Science   (Netherlands)

^c NISSAN MOTOR CO   (Japan)

Author keywords

Silicon nitride; Surface micromachining

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ETCHING; REFRACTIVE INDEX; SURFACE TREATMENT; X RAY PHOTOELECTRON SPECTROSCOPY;

SURFACE MICROMACHINING;

SILICON NITRIDE;

EID: 0031060760     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0924-4247(96)01397-0     Document Type: Article

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