A new method for thin film deposition - Faced microwave electron cyclotron resonance plasma sources enhanced direct-current magnetron sputtering

Chinese Physics Letters

Volumn 17, Issue 8, 2000, Pages 586-588

  Xu, Jun ^a   Ma, Teng Cai ^a   Lu, Wen Qi ^a   Xia, Yuan Liang ^a   Deng, Xin Lu ^a  

^a DALIAN UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; ATOMIC FORCE MICROSCOPY; CARBON FILMS; CYCLOTRONS; ELECTRON CYCLOTRON RESONANCE; ION SOURCES; MAGNETRON SPUTTERING; PLASMA SOURCES; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

CHARACTERIZATION OF THE FILMS; CN X FILMS; DIRECT CURRENT MAGNETRON SPUTTERING; DIRECT-CURRENT MAGNETRON SPUTTERING; INTERFERENCE MICROSCOPY; MAGNETRON SPUTTERING SYSTEMS; MICROSCOPY ATOMIC FORCE; MICROWAVE ELECTRON CYCLOTRON RESONANCE PLASMAS; REACTIVE MAGNETRON SPUTTERING; THIN-FILM DEPOSITIONS;

DEPOSITION RATES;

EID: 0034375937     PISSN: 0256307X     EISSN: None     Source Type: Journal    
DOI: 10.1088/0256-307X/17/8/015     Document Type: Article

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