Proton transfer to melamine crosslinkers in x-ray chemically amplified negative resists studied by time-resolved and steady-state optical absorption measurement

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 35, Issue 12 SUPPL. B, 1996, Pages 6491-6494

  Nagahara, Seiji ^a   Yamashita, Yoshio ^b   Taguchi, Takao ^b   Kozawa, Takahiro ^a   Yoshida, Yoichi ^a   Tagawa, Seiichi ^a  

^a OSAKA UNIVERSITY   (Japan)

^b SORTEC Corporation   (Japan)

Author keywords

Acid; Chemically amplified resist; Cresol novolac; Melamine crosslinker; Proton adduct; Pulse radiolysis; Synchrotron radiation; X ray lithography

Indexed keywords

EID: 0011743779     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.35.6491     Document Type: Article

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