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Vakuum in Forschung und Praxis
Volumn 16, Issue 2, 2004, Pages 58-61
Thin films of ITO as conductive, transparent electrodes;Dünne ITO-Schichten als leitfähige, transparente Elektroden
Author keywords

[No Author keywords available]
Indexed keywords

PLASMA EXCITATION; SPUTTER PRESSURE;
EID: 2442590575     PISSN: 0947076X     EISSN: None     Source Type: Journal    
DOI: 10.1002/vipr.200400214     Document Type: Article
Times cited : (6)
References (12)
  • 1
    • 2442474811 scopus 로고    scopus 로고
    • Transparente und leitfähige Oxidschichten
    • B. Szyszka, Transparente und leitfähige Oxidschichten, Vakuum in Forschung und Praxis (2001), Nr. 1, 38-45.
    • (2001) Vakuum in Forschung und Praxis , Issue.1 , pp. 38-45
    • Szyszka, B.1
  • 2
    • 84862371771 scopus 로고    scopus 로고
    • Sputtertargets für TCO-Anwendungen: Stand der Technik und neue Entwicklungen
    • Jülich, 16. - 17.09.2002, Hrsg. B. Rech und G. Stadermann, ISSN: 0949-1082
    • M. Weigert, Sputtertargets für TCO-Anwendungen: Stand der Technik und neue Entwicklungen, Forschungs-Verbund Sonnenenergie, Workshop: "TCO für Dünnschicht-Solarzellen II", Jülich, 16. - 17.09.2002, Hrsg. B. Rech und G. Stadermann, ISSN: 0949-1082.
    • Forschungs-verbund Sonnenenergie, Workshop: "TCO für Dünnschicht-solarzellen II"
    • Weigert, M.1
  • 3
    • 0030195582 scopus 로고    scopus 로고
    • ITO films for antireflective and antistatic tube coatings prepared by d.c. magnetron sputtering
    • HP. Löbl, M. Huppertz, D. Mergel, ITO films for antireflective and antistatic tube coatings prepared by d.c. magnetron sputtering, Surface & Coatings Technology 82 (1996) 90-8.
    • (1996) Surface & Coatings Technology , vol.82 , pp. 90-98
    • Löbl, H.P.1    Huppertz, M.2    Mergel, D.3
  • 5
    • 0020115402 scopus 로고
    • Electrical properties and defect model of tin-doped indium oxide layers
    • G. Frank, H. Köstlin, Electrical properties and defect model of tin-doped indium oxide layers, Appl.Phys.A 27 (1982) 197-206.
    • (1982) Appl. Phys. A , vol.27 , pp. 197-206
    • Frank, G.1    Köstlin, H.2
  • 7
    • 0032614640 scopus 로고    scopus 로고
    • A study of low temperature crystallization of amorphous thin film indium-tin-oxide
    • D.C. Paine, T. Whitson, D. Janiac, R. Beresford, Cleva-Ow-Yang, B. Lewis, A study of low temperature crystallization of amorphous thin film indium-tin-oxide, J. Appl.Phys. 85 (1999) 8445-50.
    • (1999) J. Appl.Phys. , vol.85 , pp. 8445-8450
    • Paine, D.C.1    Whitson, T.2    Janiac, D.3    Beresford, R.4    Cleva-Ow-Yang5    Lewis, B.6
  • 9
    • 0037439419 scopus 로고    scopus 로고
    • Effect of microstructures on nanocrystallite nucleation and growth in hydrogenated amorphous indium-tin-oxide films
    • 2O addition, Jpn.J.Appl.Phys. 35 (1996) 2788-92. M. Ando, E. Nishimura, K. Onisawa, T. Minemura, Effect of microstructures on nanocrystallite nucleation and growth in hydrogenated amorphous indium-tin-oxide films, J.Appl.Phys. 93 (2003) 1032-8.
    • (2003) J. Appl. Phys. , vol.93 , pp. 1032-1038
    • Ando, M.1    Nishimura, E.2    Onisawa, K.3    Minemura, T.4
  • 10
    • 0035386094 scopus 로고    scopus 로고
    • Reactive magnetron sputtering of tin-doped indium oxide (ITO): Influence of argon pressure and plasma excitation mode
    • R. Mientus, K. Ellmer, Reactive magnetron sputtering of tin-doped indium oxide (ITO): influence of argon pressure and plasma excitation mode, Surface & Coatings Technology 142-144 (2001) 748-54.
    • (2001) Surface & Coatings Technology , vol.142-144 , pp. 748-754
    • Mientus, R.1    Ellmer, K.2
  • 11
    • 0024055160 scopus 로고
    • Variations in structural and electrical properties of magnetron-sputtered indium tin oxide films with deposition parameters
    • J. Dutta, S. Ray, Variations in structural and electrical properties of magnetron-sputtered indium tin oxide films with deposition parameters, Thin Solid Films 162 (1988) 119-127.
    • (1988) Thin Solid Films , vol.162 , pp. 119-127
    • Dutta, J.1    Ray, S.2

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.