Development of a slot-excited planar microwave discharge device for uniform plasma processing

IEEE Transactions on Plasma Science

Volumn 32, Issue 1 I, 2004, Pages 101-107

  Yasaka, Yasuyoshi ^a,b   Ishii, Nobuo ^c,d   Yamamoto, Tetsuya ^e   Ando, Makoto ^f   Takahashi, Masaharu ^f  

^a MAIZURU NATIONAL COLLEGE OF TECHNOLOGY   (Japan)

^b KOBE UNIVERSITY   (Japan)

^c TOKYO ELECTRON LTD   (Japan)

^d Yamagata University ^*

^e TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^f TOKYO UNIVERSITY OF AGRICULTURE AND TECHNOLOGY   (Japan)

Author keywords

Microwave discharge; Plasma processing; Resonant absorption; Slot antenna

Indexed keywords

ELECTRIC FIELD EFFECTS; FINITE DIFFERENCE METHOD; MICROWAVES; SLOT ANTENNAS; TIME DOMAIN ANALYSIS;

MICROWAVE DISCHARGE; UNIFORM PLASMA PROCESSING;

PLASMA APPLICATIONS;

EID: 2442555815     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/TPS.2004.823977     Document Type: Article

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