Effect of the plasma parameters on the properties of titanium nitride thin films grown by laser ablation

Applied Physics A: Materials Science and Processing

Volumn 81, Issue 6, 2005, Pages 1221-1226

  Escobar Alarcon L ^a   Camps, E ^a   Castro, M A ^a   Muhl, S ^b   Mejia Hernandez, J A ^a,b  

^a INSTITUTO NACIONAL DE INVESTIGACIONES NUCLEARES   (Mexico)

^b UNIVERSIDAD NACIONAL AUTÓNOMA DE MÉXICO   (Mexico)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALS; FUNCTIONS; HARDNESS; ION BOMBARDMENT; KINETIC ENERGY; LASER ABLATION; MORPHOLOGY; PARAMETER ESTIMATION; PLASMA DENSITY; PLASMAS; THIN FILMS;

CRYSTAL SIZE; GAS PRESSURE; ION ENERGY; PLASMA PARAMETERS;

TITANIUM NITRIDE;

EID: 24144501820     PISSN: 09478396     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00339-005-3306-1     Document Type: Article

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