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Volumn 188-189, Issue 1-3 SPEC.ISS., 2004, Pages 617-622

Correlation between plasma characterization and growth of fullerene-like CNx thin films deposited by pulsed laser ablation

(6) Riascos, H a,b Zambrano, G b Prieto, P b Arroyave, M c Devia, A c Galindo, H d

a UNIVERSIDAD TECNOLÓGICA DE PEREIRA (Colombia)

b UNIVERSIDAD DEL VALLE (Colombia)

c UNIVERSIDAD NACIONAL DE COLOMBIA (Colombia)

d UNIVERSIDAD DE LOS ANDES (Venezuela)

Author keywords

Carbon nitrides; Photoemission spectroscopy; Pulsed laser deposition; Raman spectroscopy

Indexed keywords

ABSORPTION; ATOMIC FORCE MICROSCOPY; CHARACTERIZATION; FULLERENES; INFRARED SPECTROSCOPY; LASER ABLATION; LASER PULSES; PLASMA APPLICATIONS; RAMAN SPECTROSCOPY; SILICON; SYNTHESIS (CHEMICAL); THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY; YTTERBIUM COMPOUNDS;

OPTICAL EMISSION; PULSED LASER ABLATION; REFLECTION ABSORPTION INFRARED SPECTROSCOPY (RAIRS); SILICON SUBSTRATES;

CARBON INORGANIC COMPOUNDS;

CARBON NITRIDE;

EID: 14644412476 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/j.surfcoat.2004.07.024 Document Type: Article

Times cited : (16)

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