Structure and morphology of laser-ablated WO3 thin films

Applied Physics A: Materials Science and Processing

Volumn 81, Issue 6, 2005, Pages 1291-1297

  Hussain, O M ^a   Swapnasmitha, A S ^a   John, J ^b   Pinto, R ^b  

^a SRI VENKATESWARA UNIVERSITY   (India)

^b TATA INSTITUTE OF FUNDAMENTAL RESEARCH   (India)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CRYSTALLINE MATERIALS; DEPOSITION; EPITAXIAL GROWTH; LASER ABLATION; MORPHOLOGY; PARTIAL PRESSURE; THIN FILMS; X RAY DIFFRACTION;

ISO-EPITAXIAL FILMS; LASER-ABLATION TECHNIQUE; OXYGEN PARTIAL PRESSURE; SUBSTRATE TEMPERATURE;

TUNGSTEN COMPOUNDS;

EID: 24144452775     PISSN: 09478396     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00339-004-3041-z     Document Type: Article

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