Pulsed laser deposited WO3 thin films for gas sensor

Surface and Coatings Technology

Volumn 169-170, Issue , 2003, Pages 553-556

  Mitsugi, Fumiaki ^a   Hiraiwa, Eiichi ^a   Ikegami, Tomoaki ^a   Ebihara, Kenji ^a  

^a KUMAMOTO UNIVERSITY   (Japan)

Author keywords

Gas sensor; NOx; Pulsed laser deposition; Tetragonal; Triclinic; WO3

Indexed keywords

ANNEALING; ATOMIC FORCE MICROSCOPY; CHEMICAL SENSORS; CRYSTAL STRUCTURE; CRYSTALLIZATION; EXCIMER LASERS; PULSED LASER DEPOSITION; THIN FILMS;

TETRAGONAL PHASES;

TUNGSTEN COMPOUNDS;

COATING; DEPOSITION; LASER; SENSOR; SURFACE TREATMENT;

EID: 19244382280     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(03)00208-1     Document Type: Article

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