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Volumn 352, Issue 1-2, 1999, Pages 107-113

Chemical vapour deposition of epitaxial WO3 films

Author keywords

Chemical vapour deposition (CVD); Epitaxy; Optical coatings; Tungsten oxide

Indexed keywords


EID: 0345770581     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(99)00379-X     Document Type: Article
Times cited : (106)

References (24)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.