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Volumn 352, Issue 1-2, 1999, Pages 107-113
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Chemical vapour deposition of epitaxial WO3 films
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Author keywords
Chemical vapour deposition (CVD); Epitaxy; Optical coatings; Tungsten oxide
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Indexed keywords
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EID: 0345770581
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/S0040-6090(99)00379-X Document Type: Article |
Times cited : (106)
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References (24)
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