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Journal of Materials Science: Materials in Electronics

Volumn 13, Issue 7, 2002, Pages 425-432

Characterization of laser-ablated V2O5 thin films

(5) Madhuri, K V a Rao, K S a Naidu, B S a Hussain, O M a Pinto, R b

a SRI VENKATESWARA UNIVERSITY (India)

b TATA INSTITUTE OF FUNDAMENTAL RESEARCH (India)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CRYSTAL ORIENTATION; CRYSTALLIZATION; FILM GROWTH; GRAIN SIZE AND SHAPE; INFRARED SPECTROSCOPY; LASER ABLATION; PULSED LASER DEPOSITION; RAMAN SPECTROSCOPY; THIN FILMS; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

ORTHORHOMBIC LAYERED STRUCTURE; VANADIUM PENTOXIDE;

VANADIUM COMPOUNDS;

EID: 0036648332 PISSN: 09574522 EISSN: None Source Type: Journal
DOI: 10.1023/A:1016048728659 Document Type: Article

Times cited : (28)

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