Growth and characteristics of reactive pulsed laser deposited molybdenum trioxide thin films

Applied Physics A: Materials Science and Processing

Volumn 75, Issue 3, 2002, Pages 417-422

  Hussain, O M ^a   Srinivasa Rao, K ^a   Madhuri, K V ^a   Ramana, C V ^a   Naidu, B S ^a   Pai, S ^b   John, J ^b   Pinto, R ^b  

^a SRI VENKATESWARA UNIVERSITY   (India)

^b TATA INSTITUTE OF FUNDAMENTAL RESEARCH   (India)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL ORIENTATION; ENERGY GAP; FILM GROWTH; FILM PREPARATION; HIGH TEMPERATURE EFFECTS; MOLYBDENUM COMPOUNDS; MORPHOLOGY; OPTICAL PROPERTIES; OXYGEN; PARTIAL PRESSURE; POLYCRYSTALLINE MATERIALS; PULSED LASER DEPOSITION; STOICHIOMETRY; SUBSTRATES; SURFACE TOPOGRAPHY;

ORTHORHOMBIC LAYERED STRUCTURES;

THIN FILMS;

EID: 0036721988     PISSN: 09478396     EISSN: None     Source Type: Journal    
DOI: 10.1007/s003390100994     Document Type: Article

References (28)