Synthesis of microcrystalline silicon films by low energy electron-beam-induced deposition at cryogenic temperature

Materials Research Society Symposium Proceedings

Volumn 832, Issue , 2005, Pages 243-248

  Sato, Tetsuya ^a   Nakagawa, Kiyokazu ^a   Aoki, Yutaka ^b   Sato, Shouji ^b  

^a UNIVERSITY OF YAMANASHI   (Japan)

^b Miyatsu Co Ltd   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CRYOGENICS; CRYSTALLINE MATERIALS; DEPOSITION; ELECTRON BEAMS; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

CRYOGENMIC TEMPERATURE; GRAOWTH RATES; SILICON FILMS; SUBSTRATE TEMPERATURES;

SILICON;

EID: 23844522949     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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