Formation of amorphous silicon by the low-temperature tunneling reaction of H atoms with solid thin film of SiH4 at 10 K

Journal of Physical Chemistry B

Volumn 105, Issue 29, 2001, Pages 6950-6955

  Hiraoka, Kenzo ^a   Sato, Tetsuya ^a   Sato, Shoji ^a   Hishiki, Shigeomi ^a   Suzuki, Katsunori ^a   Takahashi, Yukinori ^a   Yokoyama, Tatsuya ^a   Kitagawa, Shinichi ^a  

^a UNIVERSITY OF YAMANASHI   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

TUNNELING REACTIONS;

ELLIPSOMETRY; HYDROGEN; MONOLAYERS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; REACTION KINETICS; SUBSTRATES; THIN FILMS;

AMORPHOUS SILICON;

EID: 0035954986     PISSN: 10895647     EISSN: None     Source Type: Journal    
DOI: 10.1021/jp010553b     Document Type: Article

References (23)

1. Benderskii, V.A.; Makarov, D.E.; Wight, C.A. in Chemical Dynamics at Low Temperatures; John Wiley & Sons: New York, 1994.
2. Hiraoka, K.; Ohashi, N.; Kihara, Y.; Yamamoto, K.; Sato, T.; Yamashita, A. Chem. Phys. Lett. 1994, 229, 408.
3. Hiraoka, K.; Miyagoshi, T.; Takayama, T.; Yamamoto, K.; Kihara, Y. Astrophys. J. 1998, 498, 710.
4. Hiraoka, K.; Yamashita, A.; Miyagoshi, T.; Ohashi, N.; Kihara, Y.; Yamamoto, K. Astrophys. J. 1998, 508, 423.
5. Hiraoka, K.; Yamamoto, K.; Kihara, Y.; Takayama, T.; Sato, T. Astrophys. J. 1999, 514, 524.
6. Hiraoka, K.; Sato, T.; Takayama, T. J. Mass Spectrom. Soc. Jpn. 1999, 47, 382.
7. Hiraoka, K.; Takayama, T.; Euchi, A.; Handa, H.; Sato, T. Astrophys. J. 2000, 532, 1029.
8. Hiraoka, K.; Sato, T. Radiat. Phys. Chem. 2001, 60, 1.
9. Tielens, A.G.G.M.; Allamandola, L.J. In Interstellar Processes; Hollenbach, D.J., Thronson, H.A., Jr., Eds.; Reidel: Dordrecht, 1987; p 397.
10. Tielens, A.G.G.M.; Hagen, W. Astron. Astrophys. 1982, 114, 245.
11. Mumma, M.J.; DiSanti, M.A.; Russo, N.D.; Fomenkova, M.; Magee-Sauer, K.; Kaminski, C.D.; Xie, D.X. Science 1996, 272, 1310.
12. Crovisier, J. Faraday Discuss. 1998, 109, 437.
13. Cherigier, L.; Czametzki, U.; Luggenholscher, D.; Schulz-von der Gathen, V.; Dobele, H.F. J. Appl. Phys. 1999, 85, 696.
14. Payne, W.A.; Stief, L.J. J. Chem. Phys. 1976, 64, 1150.
15. Shirai, H.; Das, D.; Hanna, J.; Shimizu, I. Appl. Phys. Lett. 1991, 26, 1096.
16. Das, D.; Shirai, J.; Hanna, J.; Shimizu, I. Jpn. J. Appl. Phys., Part 2 1991, 30, L239.
17. Fujiwara, H.; Toyoshima, Y.; Kondo, M.; Matsuda, A. Phys. Rev. B 1999, 60, 13598.
18. Das, D.; Shiraishi, H.; Hanna, J.; Shimizu, I. Jpn. J. Appl. Phys. 1991, 30, 1239.
19. Lias, S.G.; Bartmess, J.E.; Liebman, J.F.; Holmes, J.L. Levin, R.D.; Mallard, W.G. J. Phys. Chem. Ref. Data 1988, 17, Suppl. No. 1.
20. Gordon, M.S.; Xie, Y.; Yamaguchi, Y.; Grev, R.G.; Schaeffer, H.F., III J. Am. Chem. Soc. 1993, 115, 1503.
21. Takayanagi, T.; Sato, S. J. Chem. Phys. 1990, 92, 2862.
22. Efimov, V. Phys. Lett. 1970, 33B, 563; Nucl. Phys. 1973, A210, 157.
23. Efimov, V. Phys. Lett. 1970, 33B, 563; Nucl. Phys. 1973, A210, 157.