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Volumn 41, Issue 11, 2002, Pages 6534-6535
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Fabrication of micropatterns on sapphire substrates via room-temperature selective homoepitaxial growth induced by electron beam irradiation
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Author keywords
Electron beam irradiation; Laser molecular beam epitaxy; Micropattern; Sapphire substrate; Selective epitaxial growth; Wet etching
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Indexed keywords
AMORPHOUS MATERIALS;
ELECTRON BEAMS;
ELECTRON IRRADIATION;
EPITAXIAL GROWTH;
ETCHING;
FABRICATION;
FILM GROWTH;
LASER BEAMS;
MICROSTRUCTURE;
PULSED LASER DEPOSITION;
REFLECTION HIGH ENERGY ELECTRON DIFFRACTION;
SUBSTRATES;
MICROPATTERNS;
SAPPHIRE;
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EID: 0036871804
PISSN: 00214922
EISSN: None
Source Type: Journal
DOI: 10.1143/jjap.41.6534 Document Type: Article |
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Times cited : (14)
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References (11)
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