Chemical warfare agent detection using MEMS-compatible microsensor arrays

IEEE Sensors Journal

Volumn 5, Issue 4, 2005, Pages 712-724

  Meier, Douglas C ^a   Taylor, Charles J ^a   Cavicchi, Richard E ^a   White V, Edward ^a   Ellzy, Michael W ^b   Sumpter, Kenneth B ^b   Semancik, Steve ^a  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b EDGEWOOD CHEMICAL BIOLOGICAL CENTER   (United States)

Author keywords

Chemical microsensors; Chemical vapor deposition (CVD); Chemical warfare (CW) agent; Conductometric; Metal oxide; Thin film

Indexed keywords

CHEMICAL SENSORS; CHEMICAL VAPOR DEPOSITION; COLORIMETERS; MASS SPECTROMETRY; MICROELECTROMECHANICAL DEVICES; MICROORGANISMS; OPTIMIZATION; SILICON WAFERS; THIN FILMS; TIN COMPOUNDS;

CHEMICAL MICROSENSORS; CHEMICAL WARFARE AGENTS; CONDUCTOMETRIC; METAL OXIDES;

CHEMICAL WARFARE;

EID: 23844445182     PISSN: 1530437X     EISSN: None     Source Type: Journal    
DOI: 10.1109/JSEN.2005.848139     Document Type: Article

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