The effects of neodymium content and site occupancy on spontaneous polarization of epitaxial (Bi 4-xNd x)Ti 3O 12 films

Journal of Applied Physics

Volumn 98, Issue 2, 2005, Pages

  Watanabe, Takayuki ^a   Funakubo, Hiroshi ^a,b   Osada, Minoru ^c   Uchida, Hiroshi ^d   Okada, Isao ^d  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^b JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

^c NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

^d SOPHIA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CURIE TEMPERATURE; EPITAXIAL FILMS; FERROELECTRIC DIPOLES; NEODYMIUM CONTENTS;

FERROELECTRIC THIN FILMS; FERROELECTRICITY; METALLORGANIC CHEMICAL VAPOR DEPOSITION; NEODYMIUM; POLARIZATION; PULSED LASER DEPOSITION; RAMAN SCATTERING; SINGLE CRYSTALS; SUBSTITUTION REACTIONS; THIN FILMS;

SEMICONDUCTING BISMUTH COMPOUNDS;

EID: 23844441559     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1984073     Document Type: Article

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