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Volumn , Issue , 2004, Pages 171-174

Mechanical stress caused by adsorption of O or N on a Ga-terminated (100) GaAs surface: O gives compressive stress but N don't

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL BONDS; COMPRESSIVE STRESS; DEFORMATION; OXIDATION; OZONE; SEMICONDUCTING GALLIUM ARSENIDE; STRAIN; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 23744460741     PISSN: 10928669     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (4)

References (11)
  • 4
    • 23744486677 scopus 로고    scopus 로고
    • Depletion/enhancement mode InAlAs/InGaAs-MOSHEMTs with nm-Thin gate insulating layers formed by oxidation of the InAlAs layer
    • K. Nakamura et al., "Depletion/Enhancement Mode InAlAs/InGaAs-MOSHEMTs with nm-Thin Gate Insulating Layers Formed by Oxidation of the InAlAs Layer" Ext. Abst. of IPRM 2004
    • Ext. Abst. of IPRM 2004
    • Nakamura, K.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.