Reactive R.F. magnetron sputtering deposition of WO3 thin films

Sensors and Actuators, B: Chemical

Volumn 84, Issue 1, 2002, Pages 43-48

  Lemire, Ceéline ^a   Lollman, Dave B B ^a   Al Mohammad, Ahmad ^a   Gillet, Eveline ^a   Aguir, Khalifa ^a  

^a CNRS   (France)

Author keywords

Atomic force microscopy (AFM); Electron microscopy; Gas sensors; Reactive R.F. magnetron sputtering; WO3 thin films; X ray photoelectron spectroscopy (XPS)

Indexed keywords

ANNEALING; ATOMIC FORCE MICROSCOPY; COMPOSITION; CRYSTAL MICROSTRUCTURE; FILM PREPARATION; MAGNETRON SPUTTERING; NANOSTRUCTURED MATERIALS; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; SURFACE STRUCTURE; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; TUNGSTEN COMPOUNDS; X RAY PHOTOELECTRON SPECTROSCOPY;

MONOCLINIC PHASES;

CHEMICAL SENSORS;

EID: 0036680720     PISSN: 09254005     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-4005(02)00009-6     Document Type: Article

References (19)